The sputtering targets require stricter standards than those of traditional material industry. The general requirements include the following aspects: size, flatness, purity, content of various impurities, density, N/O/C/S, grain size and defect control. The stricter or special requirements include: surface roughness, resistance value, grain size uniformity, composition and microstructure uniformity, foreign matter (oxide) content and size, magnetic permeability, ultra-high density and ultra-fine grains, etc. Magnetron sputtering coating is a newly developed physical vapor deposition coating method, in which electron gun system is used to emit electrons and focus them on the plated material. In accordance with momentum exchange principle, the atoms are ejected out of the target surface with high kinetic energy, sputter towards and settle onto the substrate to form a film. This plated material is called sputtering target. Sputtering targets may be metals, alloy, ceramic compound and so on.
Magnetron sputtering coating is a newly developed physical vapor deposition coating method. Compared with evaporation coating method, it features significant advantages in many aspects. As a mature technology, magnetron sputtering has been extensively applied in many fields.
Main applications: Sputtering targets are mainly used in electronic and information industries, such as integrated circuits, information storage, liquid crystal display, laser memory, electronic control devices. It can also be applied to the field of glass coating, wear-resistant materials, high-temperature corrosion resistance, decorative items and other industries.
High-purity wide molybdenum target is one of the key raw materials in the production of AMOLED panel. Our products include ultra-wide, high-purity and high-density planar molybdenum sputtering targets suitable for TFT-LCD/AMOLED, which are mainly used in G2.5-G6 generation TFT-LCD/AMOLED, thereby filling the gap of wide molybdenum target (1800 mm) in China market.
Density: ≥ 10.2 g/cm3
Size range: Customization available as required
Appearance: Microscopic examination shows the surface with uniform metallic luster, without oxidation/hydrogenation discoloration, scratches, deformation, burrs, etc.
Application: It is used to make heating parts and heat insulation parts for vacuum heat treating furnace, and to produce digesters, heaters, coolers, various utensils and devices in chemical industry. It is also extensively applied in aerospace industry, medical instruments and other fields. The sputtering target is used for magnetron sputtering coating, which is a newly developed physical vapor deposition (PVD) method.
Rotatory target is a kind of sputtering target. The target is made into a cylindrical shape, which is equipped with a stationary magnet inside to achieve rotatory coating at a slow speed.
We can provide molybdenum sputtering targets of the following sizes as required: length ≤ 165 mm X1000 mm, purity ≥ 99.95%.
Application: Solar cell, architectural glass, automobile glass, semiconductor, flat panel TV, etc.