Copper Target
Copper target is a kind of sputtering target in vacuum coating industry, which is a high-purity copper material of a certain size and shape after a series of processing. With many excellent properties, high-purity copper has been extensively used in electronics, communication, superconductivity, aerospace and other fields.
Physical properties of copper target
Density: 8.92 g/cm3
Color: Purplish red
Melting point: 1083.4℃
Boiling point: 2567℃。
Copper target is suitable for DC bias-voltage two-pole sputtering, three-pole sputtering, four-pole sputtering, RF sputtering, facing targets sputtering, ion beam sputtering, magnetron sputtering, etc. It can be used for plating reflective film, conductive film, semiconductor film, capacitor film, decorative film, protective film, integrated circuits, display, etc. Compared with other targets, copper target is less expensive, so it is the preferred target if the functions of the film layer can be achieved.
Classification of copper target
Copper target includes planar copper target and rotatory copper target.
Planar copper target can be round or square sheet, and so on.
Rotatory copper target is tubular with high utilization rate, but it is not easy to manufacture. Rotatory copper target can be made of high-purity copper only by a series of processing such as extrusion, stretching, straightening, heat treatment and machining.
